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MEMS device and method of manufacturing the same

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专利名称:MEMS device and method of manufacturing

the same

发明人:Shingo Uchiyama,Fusao Shimokawa,Tomomi

Sakata,Nobuhiro Shimoyama,MitsuhiroMakihara,Mitsuo Usui

申请号:US12918783申请日:20090302公开号:US08482843B2公开日:20130709

专利附图:

摘要:A MEMS device includes a mirror substrate (), an electrode substrate () arranged

so as to face the mirror substrate (), a mirror () serving as a movable member rotatablysupported in an opening portion of the mirror substrate () via support members, a drivingelectrode () arranged on an insulating film () on a surface of the electrode substrate ()facing the mirror substrate () so as to face the mirror () across a gap and drive the mirror(), and a lower electrode () made of a metal or a semiconductor and formed under theinsulating film () exposed to the gap so as to be in contact with the insulating film ().

申请人:Shingo Uchiyama,Fusao Shimokawa,Tomomi Sakata,NobuhiroShimoyama,Mitsuhiro Makihara,Mitsuo Usui

地址:Kanagawa JP,Kanagawa JP,Kanagawa JP,Kanagawa JP,Kanagawa JP,Kanagawa JP

国籍:JP,JP,JP,JP,JP,JP

代理机构:Blakely, Sokoloff, Taylor & Zafman LLP

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